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Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures

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Figure 1 Representative bright-field TEM image of nylon 6,6- 6,6-GaN core-shell nanofibers
Figure 2 GIXRD patterns of InN thin films deposited at 200 °C  on various substrates using CpIn and N 2 /H 2  plasma

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