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Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma

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Figure 3 shows the GIXRD patterns of as-deposited and annealed Ga 2 O 3 films. Although these patterns belong to a film deposited at 250  C, PEALD-grown Ga 2 O 3 thin films were found to be amorphous in the as-deposited state  irre-spective of their depos

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