ContentslistsavailableatSciVerseScienceDirect
Synthetic
Metals
j o u r n a l ho me p a g e : w w w . e l s e v i e r . c o m / l o c a t e / s y n m e t
Comparative
study
of
arylene
bisimides
substituted
with
imidazole
side
group
for
different
dielectrics
on
the
OFET
application
Cem
Tozlu
a,∗,
Sule
Erten-Ela
b,
Th.
Birendra
Singh
c,
N.
Serdar
Sariciftci
c,
Sıddık ˙Ic¸
li
b,∗ aDepartmentofEnergySystemEngineering,FacultyofEngineering,Karamano˘gluMehmetbeyUniversity,70100Karaman,TurkeybSolarEnergyInstitute,EgeUniversity,Bornova,35100Izmir,Turkey
cLinzInstituteforOrganicSolarCells(LIOS),PhysicalChemistry,JohannesKeplerUniversityLinz,Altenbergerstr.69,A4040Linz,Austria
a
r
t
i
c
l
e
i
n
f
o
Articlehistory:
Received23January2013
Receivedinrevisedform25February2013 Accepted29March2013
Keywords:
Organicfieldeffecttransistor Naphthalene
Perylene Benzimidazole
a
b
s
t
r
a
c
t
Weanalyzedtheeffectofpolymericdielectricwithhydroxylandhydroxyl-freegrouponcurrent–voltage
characteristicsoforganicthinfilmtransistorbytheuseofbenzimidazole-derivedarylenebisimide
derivatives.Polyvinylalcohol(PVA)withpolargroupandbenzocyclobutene(BCB)withnon-polargroup
wereusedassolutionprocesseddielectricmaterialstocomparewitheachotherinthinfilm
transis-torapplication.Thehydroxylgrouphasasignificanteffectonturn-onvoltageandturn-offcurrentin
depletionregimeduetohydroxylgroup.Itisobservedthatthesurfacemorphologyisinfluencedbythe
chemicalstructureofpolymericdielectricconcerningsurfaceenergy.Theelectronfieldeffectmobilityof
botharylenebisimidesisenhancedbydecreasedsurfaceenergyofdielectric.Thehighestmobilitywas
obtainedbyemployingnaphthalenebis-benzimidazoleasanactivelayeronbothdielectricscompared
withperylenebis-benzimidazolesemiconductor.Theelectricalbehaviorsofthesesemiconductorsare
discussedinrelationtogatedielectricsurfaceproperties.
© 2013 Elsevier B.V. All rights reserved.
1. Introduction
Organicsemiconductorshavebeenattractingmuchattention for electronicdevices becauseof theirpotential applicationsin low-cost,largeareaandflexibledevicessuchasplasticsolarcell, flat-paneldisplaysetc.[1–3].Organicthinfilmtransistors(OTFT) based on highly conjugated p-channel or n-channel active, as organicelectronicdevices,havebeenusedonactiveandpassive matrixdisplays[4,5],radiofrequencyidentificationtags, chem-icalsensors,biological sensors,etc.[6,7].Lowmolecularweight peryleneandnaphthalenebisimidederivatives,arylenebisimides werewidelyinvestigated assmallorganicmoleculeswith vari-ous substituents tocreate advantages ontheirelectrochemical, luminescentandelectronicpropertiesallowingapplicationto con-structorganicbased electronicdevices [8–10]. Thestrong− interactions and high electron affinity are special features of these materials to utilize in n-channel organic thin film tran-sistors[11–13].Inrecentyears,electronacceptingmoietieslike halogen substituents [14–16] and polymer containing arylene bisimides [17,18] have been reported as air stable n-channel OTFT. Remarkable studies have been reported employing vari-ous perylene and naphthalenebisimides as modified dielectric
∗ Correspondingauthors.Tel.:+903882265053;fax:+902323882023. E-mailaddresses:tozlu.cem@gmail.com(C.Tozlu),sicli@yahoo.com(S. ˙Ic¸li).
layerwithpoly-methylmethacrylate(PMMA)[19,20],n-octadecyl triethoxysilane (OTS) [21], hexzamethyl disilazane (HDMS)and 3,5-bis(trifluoromethyl)thiophenol[22],onbareSiO2[23,24].The
surface modification improves drastically the performance of OTFTsincomparedonlywiththebareSiO2.Polymericdielectrics
havebeenusedwidelyingateinsulatorsinrecentyears,dueto theirfavorablechemicalandphysicalpropertiesinsolution pro-cessabledepositiontechnique.Someofthesepolymericmaterials alsocompetewiththebareSiO2insulatorforapplicationin
elec-tronics[25].Theirsurfacepropertiesinfluencedirectlymorphology ofsemiconductorsandsemiconductor/dielectricinterfaceinwhich motionofchargecarriersoccurs[26,27].ThestudiesofOTFTbased onperyleneandnaphthaleneorganicsemiconductorsareless com-monfor comparativeofperformancearylenebisimidesonbare polymericdielectricsurfaces.
We nowreporttheOTFTperformanceswithnovel naphtha-leneandperylenebisimidessubstitutedbenzimidazolegroupson hydroxyl and hydroxyl-freepolymeric insulators.The synthesis of thenaphthalene and perylene bis-benzimidazole is reported elsewhere [28,29]. Novelty of application on OTFTs for these molecular structures is the extended conjugation of aromatic rings onbare polymeric dielectrics, compared to the naphtha-lene and perylene diimides studiedin literature. Hydroxyl-free divinyltetramethyldisiloxane-bis(benzocyclobutene)(BCB,called “cyclotene”)and hydroxyl polyvinylalcohol (PVA)werechosen toevaluatetheperformanceoffabricatedtransistorsdependence 0379-6779/$–seefrontmatter © 2013 Elsevier B.V. All rights reserved.
6 C.Tozluetal./SyntheticMetals172 (2013) 5–10
ondielectricsurfaceproperties.Naphthalenebis-benzimidazole, NBBI,andperylenebis-benzimidazole,PBBI,basedOTFTsarenot usedinthinfilmtransistorasanactivelayer.
2. Experimental
Theorganicthinfilmtransistors(OTFTs)werefabricatedwith top contact/bottom gate geometry to investigate properties of dielectric/semiconductorinterfacebydepositionoforganic semi-conductor on dielectric layer. The OTFT device geometry and chemical structure of used NBBI and PBBI semiconductors are shownin Fig.1(a–c).Theindium tinoxidecoatedglasseswere patternedbyetchingwithdilutedHClforbottomgateelectrode. Prior to coating of dielectrics, the substrates were cleaned by soakinginultrasonicbathwithdistilledwater,acetoneand iso-propanol, respectively. Benzocyclobutene (BCB) and poly(vinyl alcohol) (PVA)(Mowiol® 40-8) with average molecularweight
of120,000werepurchased fromDownChemicalCompany and AldrichCompany,respectively.Themolecularstructuresof poly-meric dielectrics are shown in Fig. 1(d–e). The BCB thin film polymericdielectricwascoatedonITOsubstratebyspincoating at1500rpmin 45sand curedfor1hat285◦Cin vacuumoven underargonatmosphere.PVAthinfilmpolymericdielectricwas coatedonITOsubstratebyspincoatingof10wt/v%PVAsolution at1500rpmin45sanddriedfor24hunderroomtemperaturein vacuum.NBBIandPBBIsemiconductorswiththicknesses100nm werethermallyevaporated undervacuum(10−5mbar)atarate of0.05nm/sonBCBandPVAcoatedsubstratesundersame con-ditions,respectively.LiF/Almetalelectrode(purity99.9%)witha
Fig.1.(a)Cross-sectionalillustrationoffabricatedtopcontactOTFT,(b)chemical structuresofnaphthalenebis-benzimidazole(NBBI),(c)perylenebis-benzimidazole (PBBI), (d) divinyltetramethyldisiloxane-bis (benzocyclobutene) (BCB) and (e) polyvinylalcohol(PVA).
Fig.2. Outputcharacteristics(Ids−Vds)ofNBBIandPBBItransistorsondielectricsofBCBandPVAforvariousVgsindeviceI(a),deviceII(b),deviceIII(c)anddeviceIV(d), respectively.Allmeasurementsweretakenundersameconditions.
Fig.3. TransfercharacteristicsfordeviceI(a),deviceII(b),deviceIII(c)anddeviceIV(d).AllcurveswereobtainedunderVds=50V.Leftaxisrepresents(logIds−Vgs)curve andrightaxisI1/2ds −Vgscurve.
thickness0.6nm/60nm wasdeposited onactive layersof NBBI andPBBIwithvacuumevaporatorunder1×10−6mbarbyusing shadowmaskhavingachannellength(L)of47mandchannel width(W)of2mm.Theelectricalcharacterizationsoffabricated devicewerecarriedoutinaninertgasatmosphere.Theoutput (Ids−Vds)andtransfer(Ids−Vgs)characteristicsoffabricatedOFETs
weremeasuredwithAgilentE5273ASource/Measureunit. Sepa-ratesandwichstructuresofmetal–insulator–metal(MIM)withAu electrodeswerepreparedforcapacitance–voltagemeasurements ofdielectricfilms.AHP4842ALCRmeterwasusedforthe geometri-calcapacitancemeasurementsofinsulatorinMIMdevicestructure. Thesurfacemorphologiesofdielectricfilmsandactivelayerswere examinedintappingmodewitha Q-Scope250ScanningProbe MicroscopeAmbiosTechnologyoperatingat roomtemperature. Thethicknessofthedielectricwasdeterminedbyasurface pro-filometer(AmbiosXP-1).
Inthisstudy,devicesarereferredasdeviceIanddeviceIIfor NBBIandPBBIbasedOTFTsontheBCBdielectric,deviceIIIand deviceIVforNBBI andPBBIbasedOTFTsonthePVA dielectric, respectively.
3. Resultsanddiscussion
ThethicknessesofpolymericdielectricfilmsofPVA andBCB wereadjustedtoobtaininsameordercapacitancevaluesof insu-latedfilms.ThecapacitancevaluesofBCBandPVAinsulatorswere found to be 1.2nF/cm2 and 1.8nF/cm2 with 2m and 3.8m
filmthicknesses,respectively.Thedielectricconstantsofinsulators frommeasureddielectricthicknesseswereestimatedasεPVA=8
andεBCB=2.6,respectively.Thepolymericinsulatedfilmsdifferin
theirsurfaceenergydependonmolecularstructures.Thesurface energyofBCBandPVAwere34.3mJ/m2 and45mJ/m2 in
accor-dancewiththeRefs.[30,31],respectively.
AllOTFTswerefabricatedunderthesameconditionsinorder toabletocomparewitheachother.Alldevicespresenttypical n-channeltransistoroutputcharacteristicsasafunctionofVgs.The
outputcharacteristicsofalldevicesfabricatedontopofthe poly-mericgate-insulatorwithLiF/Altop drain-sourcecontactswere showninFig.2(a–d).ThedraincurrentIdsincreaseslinearlywith
Vds, at low voltages, implies that good establishment of ohmic
contactforelectroninjectionbetweensemiconductorsandLiF/Al contacts. When the output characteristics of devices are com-pared withPVA and BCB dielectrics,thewell-defined pinch-off (Vds≈Vgs−Vth)voltagesarenotobservedasshowninFig.2.Inideal
thin filmtransistor (TFT),the differentialresistancer=
∂
Vds/∂
Idsmust behighin thesaturationregime(Vds>Vgs).In contrastto
idealTFToutputcharacteristics,deviceswithexceptionofdevice IIIexhibitedalowdifferentialresistanceinoutputcharacteristics abovethepinch-offvoltages.Thehighconductivityinsaturation regimecanbeattributedtothepresenceofinterfacechargesatthe dielectric/semiconductorinterface[32].
Fig. 3(a–d) depicts the transfer characteristics (logIds−Vgs)
and (Ids1/2−Vgs)of OTFTs at Vth=50V to illustrate turn-off and
turn-onstatebehaviorbysweepinggatevoltage.Themagnitude oftheturn-offcurrentexhibitsadependenceonpolymericgate dielectric,PVAgateinsulateddevicesshowedveryhighoffcurrent comparedwithBCBgateinsulateddevicetransfercharacteristicsin depletionregime(Vgs≤0V).TheOH−groupofPVAhassignificantly
largedipolemomentthatcreatesinternalelectricfieldinaddition to gate induced field at the semiconductor/dielectric interface. AlthoughcapacitancevalueofPVAgatedielectriciscomparable withBCBdielectric,draincurrentisverylargeinbothaccumulation regimeandalsoindepletionregimeforPVAdielectricduetodipole fieldofgateinsulator.Inadditiontoturn-offcurrent,weevaluated turn-on voltagewhichis definedasthegatevoltagewhere the drain current starts to increase. From transfer characteristic of
8 C.Tozluetal./SyntheticMetals172 (2013) 5–10
Fig.4. Atomicforcemicroscopy(AFM)imagesofNBBIfilm(a)andPBBIfilm(b)whichweredepositedonBCBlayers;NBBIfilm(c)andPBBIfilm(d)whichweredeposited onPVAdielectric.Allimagesweretakenintappingmode.
devices,thelargenegativeturn-onvoltagewasobservedforPVA gateinsulateddevicescomparedwithBCBdielectric.Thisnegative turn-onvoltageshowspresencesoftrapstatesthatprovidemobile charge in the channel formed at the dielectric/semiconductor interface [33,34] and also molecular dipole field of dielectric influencesturn-onvoltageabsolutelyduetoband-bendingatthe insulator/semiconductorinterface[35,36]. Thehysteresiseffects werealsoobservedespecially in thepresenceof PVA dielectric whichhavehydroxylgroup.Althoughthereareseveralarguments astothemechanismofthehysteresiseffectinOFET,theresults showthatthechargeinjectionandtrappingmechanismaremain sourcesofhysteresismechanisminOFETwhichisproducedonthe dielectricwithOH−[37].Furthermore,forinvestigationofinterface trapsinfluencesontransfercharacteristics,subthresholdswing,S, whichispointedoutthesharpnessoffieldeffectonsetdetermined from inverse slope of the log(Ids) versus Vgs below threshold
voltage, was evaluated. From transfer characteristics of below thresholdvoltage whichis extracted froma slope of(Ids(sat))1/2
versusVgswhereinterceptontheVgsaxis,alldevices exhibited
largesubthresholdswing(S).Actuallynormalizedsub-threshold swing,SN=S×Ci whereCiis thedielectric capacitanceper unit
area,permitstocomparemoreaccuratelydevicesbehaviorbelow thresholddependsondielectric thicknessand varyingdielectric materials.Thenormalized subthresholdswingvalues varyfrom
50nFVdecade−1cm−2 to 120nFVdecade−1cm−2, the largest valuewasobtainedfromPVAinsulateddevices thatshowmore deepinterfacetraps.Thesubthresholdswingdependsonnotonly dielectricthicknessandalsostronglyinterfacetrapspositionnext tointerface[38].Thedeviceparameters extractedfromtransfer characteristicsofOTFTsusingEq.(1)aresummarizedinTable1. Thesaturatedelectronfield-effectmobility,,wasobtainedfrom saturatedregimeofOTFTbyusingfollowingequation[39], (Ids(sat))1/2=
W2LCi
1/2(Vgs−Vth) Vds>Vgs−Vth (1)
whereIdsisthedrain–sourcecurrent,Wisthewidthofchannel,
L is thechannel length, Ci is the capacitance per unit area of
theinsulator.Vgsisthegatevoltage,isthemobilityofcharge
carrierandVthisthethresholdvoltage.Aslopeof(Ids(sat))1/2versus
Vgs determines saturated electron field-effect mobility, , and
thresholdvoltagesinwhichinterceptVgsaxis.
The saturated electron mobilities of devices fabricated on BCB dielectrichave highermobility compared withsame semi-conductorsbaseddevicesfabricatedonPVAdielectricalthoughthe permittivityofPVAismuchhigherthanBCB.Thecarriermobilities ofarylenebisimidederivativesbasedOTFTsincreasedasthesurface energyofthegatedielectricdecreased.Asdiscussedforpentacene smallmoleculesinbyYangetal.[40],mobilityvaluesofpentacene
Table1
SummaryofdeviceparametersforNBBIandPBBIbasedOTFTswithPVAandBCBdielectrics.
Device Semiconductor Dielectric V0(V) Vth(V) e(cm2V−1s−1)
DeviceI NBBI BCB 0 15 1×10−3
DeviceII PBBI BCB −2 18 1.6×10−4
DeviceIII NBBI PVA −12 3.9 8.1×10−4
DeviceIV PBBI PVA −16 2.8 9×10−5
Thevaluesshownhereareanaverageofatleastsixdifferentdevicesfabricatedundersameconditions.
decreasedwithincreasingsurfaceenergyofdielectric.Shinetal.
investigated the effects of polar functional groups of dielectric
resultingfromO2plasmatreatment.Theyfoundthatthemobility
ofpentaceneincreasesasdecreasesurfaceenergyofgatedielectric
withlargepolarfunctionalgroups[41].Gaoetal.demonstrated
similarresultsbyinvestigatingrelationshipbetweenmobilityand surfaceenergyofgatedielectricregardingthesurfaceenergyof activesemiconductor.Itisgenerallyacceptedthatthehigherfield effectmobility is achieved in case identicalsurface energies of dielectricandthesemiconductor[42].Thetransfercharacteristics ofsemiconductorsshowthatnaphthalenebis-benzimidazolehas agood performanceinOTFTonbothdielectricscompared with perylenebis-benzimidazoleonthesamegateinsulatedlayer.This performance difference mayattribute tofacilitation of channel formationandstrong–interactionatinsulator/NBBIinterface. Inordertoexaminethesurface effectsonthechargecarrier mobility depends on dielectric and semiconductors, an atomic forcemicroscopy(AFM)wasused.Beforecomparisoninsurface morphologiesofsemiconductorsonPVAandBCBinsulating-films, weevaluatedthesmoothnessofbare insulatorfilms.Themean roughnessofPVAwas0.2nmandthatofBCBwas0.43nm, indicat-ingthereisnolargedifferencesinroughnessofinsulating-films. Fig.4(a–b)depictsatomicforcemicroscopy(AFM)imageofvacuum evaporatedNBBIandPBBIfilmsonBCBlayerinthreedimensions. NBBIandPBBIfilmsexhibitroughsurfacewitharoot-meansquare (RMS)roughnessof1.73nmand1.33nm,respectively.Thegrains ofsemiconductorgrowthanislandshapeonBCBdielectricwith averagepeaktovalleydistanceof110nmforNBBIand150nmfor PBBI.Theaveragemaximumheightvalueofgrainsaboveaverage filmthicknessonBCBdielectriclayerwasfoundtobe5.57nmfor NBBIand4.392nmforPBBI,respectively.Thefilmmorphologies ofNBBIandPBBIonPVAdielectriclayerareshowninFig.4(c–d). ThegrainheightsofNBBIdepositedonPVAinsulating-filmwere decreased withtheexception ofsomeisland formationslocally whicharesufficientlyseparatedfromeachother,whilePBBI semi-conductorshowsasamorphous-likefilmswholethesurface.These imagesshowanevidenceoflower mobilitydue tograinshape propertiesonsurface.Althoughvalleysactasacarriertrapsdue to roughness scattering at first or second semiconductor layer formedclosetotheinterface,itisdifficulttoestimateinterface morphologyfromAFMimagesoftopsurface.Hence,wecanmerely makeanassumptionaboutthechargecarriermobilitydependence ongrainsappeared ontopsurfaces.In generally, grains signifi-cantlyinfluencethetransport mechanism ofcharge carrierand itsmobilitydue tohoppingprocess betweenorganicmolecules [43]. The grain size differenceof same semiconductors on dif-ferentinsulating-filmscanbeattributedtotheRMSdifferences andhydrophilic/hydrophobicpropertyofinsulatorfilms.The ary-lenebisiimidessubstitutedwitharomaticsidechainscanchange surfacepropertyfromhydrophilictohydrophobic.Inthecaseof C O and N H terminated perylene and naphthalene tetra car-boxylicdimidesmayshowrelativelymorehydrophilicsurfacein accordancewithdensityofpolargroups.Thegrainsof semiconduc-torgrowthshowmoreorderedaggregationsandbetterelectrical characteristicsinthepresenceofsubstratewiththesamesurface property.
4. Conclusion
Adetailedstudyofn-channelOFETsbasedonnaphthaleneand perylene bis-benzimidazole is presentedby incorporating polar andnon-polarpolymericdielectrics.Wefindthedipolemoment depending onthe polarfunctional groups modifies thesurface potentialoftheinterfacenexttochannelandinducesmobilecharge carriersatturn-offstateofOTFT.Experimentalresultsindicatethat thechoiceofgatedielectricscandominatetheelectrical perfor-manceofOTFTbyinfluencingmorphologyandstructureofactive layer.Thepresenceofhydroxylinpolymericdielectrichasaneffect ontheinterfacialelectrontrappingstatesnexttochannelat insu-lator/semiconductor.ThehighestmobilitywasobtainedfromBCB gate insulatedalthoughitscapacitance valueandpermitivityis lowerthanPVAdielectric.Theresultsshowedthatnaphthalene bis-benzimidazolehasagoodperformanceinOTFTonbothdielectrics compared with perylenebis-benzimidazole. The imidazole side groupinfluencessignificantlychargecarriermobilityandsurface morphologyduetosurfaceenergyoforganicthinfilm.
Acknowledgments
This studywas supportedby European Science Foundation-ExchangeGrantofORGANISOLARandEUFP6OrgaPVNetprojects. We acknowledge Scientific and Technological Research Council of TURKEY(TUBITAK)and StatePlanningOrganization (DPT)of Turkey.
References
[1]H.Hoppe,N.S.Sariciftci,JournalofMaterialsResearch19(2004)1924. [2]G.B.Blanchet,Y.L.Loo,J.A.Rogers,F.Gao,C.R.Fincher,AppliedPhysicsLetters
82(2003)463.
[3]F.Eder,H.Klauk,M.Halik,U.Zschieschang,G.Schmid,C.Dehm,AppliedPhysics Letters84(2004)2673.
[4]J.H.Lee,D.N.Liu,S.T.Wu(Eds.),IntroductiontoFlatPanelDisplays,JohnWiley &SonsLtd.,Wiltshire,2008.
[5]L.Zhou,A.Wanga,S.C.Wu,J.Sun,S.Park,T.N.Jackson,AppliedPhysicsLetters 88(2006)83502–83504.
[6]Z.Bao,J.Locklin(Eds.),OrganicField-EffectTransistors,TaylorandFrancis,Boca Raton,2007.
[7]L.Wang,D.Fine,D.Sharma,L.Torsi,A.Dodabalapur,Analyticaland Bioanalyt-icalChemistry384(2006)310.
[8]S.K.Lee,Y.Zu,A.Herrmann,Y.Geerts,K.Mullen,A.J.Bard,Journalofthe Amer-icanChemicalSociety121(1999)3513–3530.
[9]P.Gawrys,D.Boudinet,M.Zagorska,D.Djurado,J.M.Verilhac,G.Horowitz,J. Pécaud,S.Pouget,A.Pron,SyntheticMetals159(2009)1478–1485. [10]E.E.Neuteboom,S.C.J.Meskers,E.W.Meijer,R.A.J.Janssem,Macromolecular
ChemistryandPhysics205(2004)217–222.
[11]C.Tozlu,S.ErtenEla,S.Icli,SensorsandActuatorsA:Physical161(2010) 46–52.
[12]T.N.Krauss,J.Major,E.Barrena,V.Dehm,X.N.Zhang,F.Würthner,D.G.de Oteyza,L.P.Cavalcanti,H.Dosch,Langmuir24(2008)12742–12744. [13]M.M.Torrent,C.Rovira,ChemicalSocietyReviews37(2008)827–838. [14]R.Schmidt,A.M.Krause,J.H.Oh,K.Radacki,P.Erk,Y.S.Sun,M.Deppisch,H.
Braunschweig,Z.Bao,M.Könemann,F.Würthner,JournaloftheAmerican ChemicalSociety131(2009)6215–6228.
[15]B.A.Jones,A.Facchetti,M.R.Wasielewski,T.J.Marks,JournaloftheAmerican ChemicalSociety129(2007)15259–15278.
[16]H.Z.Chen,M.M.Ling,X.Mo,M.M.Shi,M.Wang,Z.Bao,ChemistryofMaterials 19(2007)816–824.
[17]Z.Chen,Y.Zheng,H.Yan,A.Facchetti,JournaloftheAmericanChemicalSociety 131(2009)8–9.
10 C.Tozluetal./SyntheticMetals172 (2013) 5–10 [18]S. Hüttner,M. Sommer,M. Thelakka, AppliedPhysics Letters 92 (2008)
93302–93305.
[19]A.S.Molinari,H.Alves,Z.Chen,A.Facchetti,Al.F.Morpurgo,Journalofthe AmericanChemicalSociety131(2009)2462–2463.
[20]S.Tanida,K.Noda,H.Kawabata,K.Matsushige,ThinSolidFilms518(2009) 571–574.
[21]M.M.Ling,P.Erk,M.Gomez,M.Koenemann,J.Locklin,Z.Bao,Advanced Mate-rials19(2007)1123–1127.
[22]C.Piliego,D.Jarzab,G.Gigli,Z.Chen,A.Facchetti,M.A.Loi,AdvancedMaterials 21(2009)1–4.
[23]B.A.Jones,A.Facchetti,T.J.Marks,M.R.Wasielewski,ChemistryofMaterials19 (2007)2703–2705.
[24]H.E.Katz,A.J.Lovinger,J.Johnson,C.Kloc,T.Siegrist,W.Li,Y.-Y.Lin,A. Doda-balapur,Nature404(2000)478–480.
[25]A.Facchetti,M.H.Yoon,T.J.Marks,AdvancedMaterials17(2005)1705–1725. [26]F.C.Chen,C.H.Liao,AppliedPhysicsLetters93(2008)103310–103313. [27]H.Kawaguchi,M.Taniguchi,T.Kawai,SyntheticMetals15(8)(2008)355–358. [28]S.Erten,S.Icli,InorganicaChimicaActa361(2008)595.
[29]S.Erten,F.Meghdadi,S.Gunes,R.Koeppe,N.S.Sariciftci,S.Icli,European Phys-icalJournalAppliedPhysics36(2007)225.
[30]F.A. Yildirim, R.R. Schliewe, W. Bauhofer, R.M. Meixner, H. Goebel, W. Krautschneider,OrganicElectronics9(2008)70–76.
[31]Th.B.Singh,F.Meghdadi,N.SerapGünes,G.Marjanovic,P.Horowitz,S.Lang, N.S.Bauer,Sariciftci,AdvancedMaterials17(2005)2315–2320.
[32]Th.B.Singh,N.Marjanovic,P.Stadler,M.Auinger,G.J.Matt,S.Günes,N.S. Sari-ciftci,JournalofAppliedPhysics97(2005)83714.
[33]C.Erlen,P.Lugli,IEEETransactionsonElectronDevices56(2009)546–552. [34]S.Scheinert,K.P.PErntich,B.Batlogg,G.Paasch,JournalofAppliedPhysics102
(2007)104503–104510.
[35]K.P.Pernstich,S.Haas,D.Oberhoff,C.Goldmann,D.J.Gundlach,B.Batlogg,A.N. Rashid,G.Schitter,JournalofAppliedPhysics96(2004)6431–6438. [36]Y.Jang,J.H.Cho,D.H.Kim,Y.D.Park,M.Hwang,K.Cho,AppliedPhysicsLetters
90(2007)131104–131106.
[37]Cheon An Lee, Dong-Wook Park, Sung Hun Jin, Yoo Chul Kim, Han Park,JongDunkLee,Byung-GookPark,AppliedPhysicsLetters 88(2006) 262120–2621123.
[38]S.Scheinert,G.Paasch,M.Schröder,H.K.Roth,S.Sensfuß,Th.Doll,Journalof AppliedPhysics92(2002)330–337.
[39]S.M.Sze,PhysicsofSemiconductorDevices,3rded.,Wiley,NewYork,2007. [40]S.Y. Yang, K. Shin, C.E. Park, Advanced Functional Materials 15 (2005)
1806–1814.
[41]K.Shin,S.Yoon,C.Yang,H.Jeon,C.E.Park,OrganicElectronics8(2007)336–342. [42]J.Gao,K.Asadi,J.B.Xu,J.An,AppliedPhysicsLetters94(2009)93302–93305. [43]G.Horrowitz,M.H.Hajlaoui,AdvancedMaterials12(2000)1046–1050.